Si上直接生长Bi_2Sr_2CaCu_2Ox超导薄膜的难点分析

Analysis of Difficulties Depositing Bi_2Sr_2CaCu_2Ox Superconducting Films on Bare Silicon Substrates

对单晶Si衬底上直接生长Bi2Sr2CaCu2Ox（BSCCO）高温超导薄膜中所出现的原子互扩散和热应力失配两个主要问题作了较系统的理论和实验研究，并提出采用缓冲层技术的可行性和必要性。

In this paper, atomic diffusion and mismatch of thermal expansion coefficients between BSCCO and Si are inrestigated experimentally and theoreticaly for BSCCO films sputteredyon Si(100) substrates directly. The feasibility and necessity of adopting buffer layer in BSCCO/Si are discussed.