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直流磁控溅射有机衬底和玻璃衬底ZnO:Al薄膜结构特性 被引量:2

ZnO: Al films deposition on organic and glass substrate by DC magnetron puttering
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摘要 利用直流磁控溅射法在有机薄膜衬底和普通玻璃衬底上制备出了具有良好附着性的ZnO:Al薄膜,并分析了氧分压、溅射压强、沉积时间、温度对薄膜结构特性的影响。研究发现,铝掺杂的氧化锌薄膜是多晶膜,具有六角纤锌矿结构,ZnO:Al薄膜具有(002)择优取向。在同样的制备条件下,薄膜的晶化在普通玻璃上比在PET衬底上要好,但是在特定的条件下(沉积时间15 min),在PET衬底上的要比普通玻璃衬底上的好。 ZnO:Al films have been deposited on Polyethylene terephathalate (PET) and glass substrates by DC magnetron sputtering technique. The structure properties of deposited films were investigated. The samples are polycrystalline with a hexagonal wurtzite structure and have a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface. The results showed that in the same condition, the crystalline volume fraction on glass substrate is better than that on the PET, but in the special case, the result is opposite.
出处 《可再生能源》 CAS 2008年第4期64-68,72,共6页 Renewable Energy Resources
关键词 有机衬底 ZNO:AL 晶化 flexible substrate ZnO:Al films crystalline volume fraction
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参考文献4

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同被引文献16

  • 1宋学萍,周旭,孙兆奇.射频磁控溅射ZnO薄膜的结构和应力特性[J].合肥工业大学学报(自然科学版),2007,30(9):1117-1120. 被引量:2
  • 2李素敏,赵玉涛,张钊.磁控溅射制备柔性衬底ZnO:Ga透明导电膜微结构及性能研究[J].太阳能学报,2007,28(11):1233-1238. 被引量:8
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