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步进扫描式光刻机隔振试验平台主动减振系统试验研究 被引量:4

Experimental Research on an Active Vibration Control System of the Step and Scan Lithography Vibration Isolation Platform
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摘要 根据步进扫描式光刻机的振动特点,设计隔振试验平台的减振系统,并对试验平台的主动减振系统进行测试研究。测试结果表明,步进扫描式光刻机隔振试验主动减振系统,能有效降低光刻机工作过程中运动部件对工作平台的冲击,具有良好的减振效果。 According to the vibration characteristic of the step and scan lithography, the vibration reduction system of the vibration isolation platform is designed, and the experimental research on its active vibration control is conclucted. The testing result indicates that the active vibration control system of the step and scan lithography vibration isolation platform can reduce the vibration of the lithography caused by the moving parts effectively and the damping effect is satisfactory.
出处 《噪声与振动控制》 CSCD 北大核心 2008年第4期3-5,共3页 Noise and Vibration Control
基金 国家自然科学基金委项目重大项目课题(编号:50390064) 上海市科委联合资助项目<精密机械减振隔振技术研究>
关键词 振动与波 步进扫描式光刻机 主动减振 试验研究 vibration and wave the step and scan lithography active vibration control experimental research
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  • 1张兴 黄如 刘小彦.微电子学概论[M].北京:北京大学出版社,2002.17-218.
  • 2[1]International Technology Roadmap for Semiconductors,1999 Edition
  • 3[2]Ghani T,Mistry K,Packan P,et al.Asymmetric source/drain extension transistor structure for high performance sub-50nm gate length CMOS devices.Symp VLSI Tech Dig,2001:17
  • 4[3]Yu B,Wang H,Xiang Q,et al.Scaling towards 35nm gatelength CMOS.Symp VLSI Tech Dig,2001:9
  • 5[4]Holmes S J,Mitcheli P H,Hakey M.Manufacturing withDUV lithography.IBM J Res Develop,1997,41(1/2):7
  • 6[5]Chiu G L T,Shaw J M.Optical lithography:introduction.IBM J Res Develop,1997,41(1/2):3
  • 7[6]Rothschild M,Forte A R,Kunz R R,et al.Lithography at a wavelength of 193nm.IBM J Res Develop,1997,41(1/2):49
  • 8[7]Bloomstein T M,Rothschild M,Kunz R R,et al.Critical issues in 157nm lithography.J Vac Sci Technol,1998,B16(6):3153
  • 9[8]Gwyn C W,Stulen R,Sweeney D,et al.Extreme ultraviolet lithography.J Vac Sci Technol,1998,B16(6):3142
  • 10[9]Liddle J A,Berger S D,Biddick C J,et al.The scattering with angular limitation in projection electron-beam lithography (SCALPEL) system.Jpn J Appl Phys,1995,34(Part 1):6663

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