半导体生产过程的Run-to-Run控制技术综述

Review on Run-to-Run control in semiconductor manufacturing

Run-to-Run通过对历史批次过程数据的统计分析改变下一批次的制程方案(recipe),解决间歇过程尤其是半导体生产过程中在线测量手段缺乏造成实时过程控制难以实施的问题,从而降低批次间产品的品质差异.这一方法是统计过程控制和实时控制的折中,提供了一个提升产品质量、改善总体设备效能的框架.介绍了Run-to-Run控制的产生背景,阐述了Run-to-Run控制器的一般结构,重点介绍了3类主要的Run-to-Run控制算法,对各种Run-to-Run控制算法进行了评价,并介绍了它们在关键单元操作中的应用,最后探讨了未来的研究方向.

Run-to-Run control updates the process recipe by using the historical process data. It overcomes the difficulties in carrying out real-time process control due to the lack of suitable in-situ measurements in batch process especially in semiconductor manufacturing. As a compromise between statistical process control and real-time control, Run-to-Run control provides a framework to enhance the product quality and overall equipment effectiveness. This work introduced the background of Run-to-Run control in semiconductor manufacturing and the common structures of Run-to-Run controllers, emphasized on three kinds of Run-to-Run control algorithms, evaluated the performance of these algorithms, and introduced the applications of these algorithms on key unit operations, finally discussed the future development.