期刊文献+

808nm半导体激光器的腔面反射率设计 被引量:6

Design of Cavity Facet Reflectivity for 808nm Semiconductor Lasers
下载PDF
导出
摘要 通过对不同腔长的808nm半导体激光器单管进行P-I测试,提取出了材料内部参数,如内量子效率、内损耗、透明电流密度、模式增益等。根据得出的内部参数进行了腔面反射率设计,分析腔面反射率与功率转换效率的关系,得出了关系曲线。进行腔面镀膜实验,把实验值与计算值相比较,二者相吻合。通过这种腔面反射率设计方法,可以得到半导体激光器的最大功率转换效率,从而使其工作于优化状态下。 Material internal parameters, such as internal quantum efficiency, internal loss, transparent current density mode gain and so on, were obtained by P-I test for different cavity length 808nm semiconductor laser diodes. The relation between cavity facet reflectivity and power conversion efficiency was analyzed, and the relation curves were acquired by the design of cavity facet reflectivity according to these internal parameters. Then, we did cavity facet coating experiments. Experimental results are well consisted with the theoretical prediction through comparison. The maximal power conversion efficiency can be achieved through the design of cavity facet reflectivity, and the semiconductor laser diodes can work in an optimal condition.
出处 《光电工程》 EI CAS CSCD 北大核心 2008年第9期41-44,共4页 Opto-Electronic Engineering
基金 国家自然科学基金(60676035) 河北省自然科学基金(F2005000084)
关键词 半导 体激光器 反射率 镀膜 功率转换效率 腔面 semiconductor lasers reflectivity coating power conversion efficiency cavity surface
  • 相关文献

参考文献8

  • 1Crump P, Dong W M, Grimshaw M, et al. 100-W+ diode laser bars show >71% power conversion from 790-rim to 1000-rim and have clear route to > 85% [J]. SHE, 2007, 6456: 64560M
  • 2Peters M, Rossin V, Everett M, et al. High-power, high-efficiency laser diodes at JDSU [J]. SPIE, 2007, 6456: 64560G
  • 3John G Endfiz, Mitral Vakili, Gerald S Browder, et al. High power diode laser arrays [J]. IEEE Journal of quantum electronics, 1992, 28(4): 952-965.
  • 4辛国锋,陈国鹰,陈高庭,瞿荣辉,方祖捷,花吉珍,赵润.大功率半导体激光器腔面镀膜的理论研究[J].中国材料科技与设备,2006,3(6):57-60. 被引量:2
  • 5Panchal C J, Mistry S N, Patel N K M, et al. Facet coating of diode laser for high power and high reliable operation [J]. SPIE, 2003, 4829: 18-19.
  • 6Higashi T, Ogita S, Soda H, et al. Optimum Asymmetric Mirror Facet Structure for High-efficiency Semiconductor Lasers [J]. IEEE J. Quantum Electron, 1993, 29(8): 1918-1923.
  • 7江剑平.半导体激光器[M].北京:电子工业出版社,2001.
  • 8刘恩科,朱秉升,罗晋生.半导体物理学[M].北京:电子工业出版社,2004.

共引文献13

同被引文献54

  • 1刘云,廖新胜,秦丽,王立军.大功率半导体激光器叠层无氧铜微通道热沉[J].发光学报,2005,26(1):109-114. 被引量:17
  • 2CRUMP P, DONG W M, GRIMSHAW M, et al. 100 W diode laser bars show >71%power conversion from 790 nm to 1 000 nm and have clear route to >85% [J]. Proe of SPIE, 2007, 6456: 64560M-1-64560M-11.
  • 3BOTEZ D, MAWST L J, BHATTACHARYA A, et al. 66% CW wallplug efficiency from Al-free 0. 98 tLm-emitting diode lasers [J]. Electronics Letters, 1996, 32 (21): 2012 - 2013.
  • 4江剑平.半导体激光器[M].北京:电子工业出版社,2002.343.
  • 5BHAT R, ZAH C E, KOZAM A, et al. High performance 1.3 μm AIGalnAs/ InP strained quantum well lasers grown by organometallic chemical vapor deposition [J].Journal of Crys- tal Growth, 1994, 14 (5):858-865.
  • 6ZAH C E, BHAT R, PATHAK B N, et al. High perfor- mance uncooled 1.3μm A1GaInAs/InP strained-layer quantum well lasers for subscriber loop applications [J]. IEEE Journal of Quantum Electronics, 1994, 30 (2) : 511 - 523.
  • 7KAZARINOV R F, BELENKY G L. Novel design of AIGaInAs- InP lasers operating at 1.3 μm [J]. IEEE Journal of Quantum Electronics, 1995, 31 (3): 423-426.
  • 8ALLOVON M, QUILLEC M. Interest in A1GalnAs on InP for optoelectronic applications [J]. IEE Proceedings J Opto- electronics, 1992, 139 (2): 148-152.
  • 9YAMAMOTO N, SEKI S, NOGUCHI Y, et al. Design crite- ria of 1.3 μm multiple quantum well lasers for high tempera- ture operation [J]. IEEE Photonics Technology Letters, 2000, 12 (2): 137-139.
  • 10TILMANS H A C, LEGTENBERG tL Electrostatic,ally driven va- cuum-encapsulated polysilicon resonators [ J ]. Sensors and Aetuators: A, 1994, 45 (1): 67-84.

引证文献6

二级引证文献5

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部