电沉积非晶态镍磷合金晶化过程研究

Study on Crystallization Process of Eletro-deposited Amorphous Ni-P Alloy

利用差示扫描量热仪(DSC)和X射线衍射仪(XRD)研究了w(P)=12.3%的电沉积非晶态镍磷合金镀层的晶化过程。结果表明,w(P)=12.3%的非晶态镍磷合金镀层的DSC曲线具有4个放热峰;镀层在260℃热处理时仍保持非晶结构;在270、290、300和320℃热处理后,析出亚稳相Ni12P5和Ni5P2;在360℃热处理后,亚稳相Ni12P5减少,亚稳相Ni5P2消失,析出Ni3P和Ni;镀层经420℃热处理后,亚稳相Ni12P5和Ni5P2完全消失,晶化产物为Ni3P和Ni。

The crystallized process of eletro-deposited amorphous Ni-P alloy （12.3wt%P） was studied by differential scanning calorimeter （DSC） and X-ray diffraction （XRD）. The results show that the DSC curve of Ni-P deposit containing 12.3%P has 4 exothermic peaks; the Ni-P deposit annealed at 260 ℃ remains amorphous structure; the metastable Ni12P5, Ni5P2 phases are precipitated when annealed at 270 ℃, 290 ℃, 300 ℃ ＆ 320℃; when annealed at 360 ℃, the stable Ni3P, Ni phases are precipitated, the amounts of metastable Ni12P5 phase reduces, and the metastable Ni5P2 phase disappears; when annealed at 420 ℃, there are only stable Ni3P, Ni phases, the metastable Ni12P5, Ni5P2 phases have thoroughly disappeared.