摘要
采用扫描电镜、X射线衍射仪、原子吸收光度计和电子探针等仪器,研究了含有铋离子的酸性硫酸铜电解液中阴极铜沉积的电结晶生长形态、结晶的晶面取向以及铜沉积层的化学组成.研究结果表明:65℃时,在通常的电流密度i=200A·mol/L-2下电解,铋不会在阴极沉积;铋离子对铜沉积层的晶面取向(220)基本不影响,电解液中存在高浓度铋离子时对(220)晶面生长起促进作用,对其它晶面生长起较强的抑制作用;铋离子影响铜沉积的电结晶生长形态和铜沉积层的晶胞尺寸.
The electrocrystal formation, crystal orientation and the chemical composition of the cathodic copper deposition in the presence of Bi3+ in the electrolyte of acidified CuSO4 are studies by scanning electron microscopy, Xray diffraction, atomic absorption and EDAM. The results indicate that the Bi could′t deposit on cathode when copper electrolysed at common current density i=200 A·mol/L-2 and t=60 ℃. Bi3+ scarcely effected on the crystal orientation (220) of copper deposition. High concentration Bi3+ in the electrolyte promoted (220) growth and inhibited the other crystal orientation growth. Bi3+ effected on electrocrystal formation and the cell dimension of copper deposition.
出处
《电化学》
CAS
CSCD
1997年第4期395-400,共6页
Journal of Electrochemistry
关键词
铋
铜沉积
炼铜
电解精炼
Bismuth, Copper depostion, Electrocrystal formation, Crystal orientation, Cell dimension