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化学镀非晶态Ni-P层的初期沉积过程研究 被引量:4

The Initial Process of Amophous Electroless Nickel
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摘要 化学镀非晶态Ni-P镀层初期沉积过程和沉积层状态是影响结合强度的决定性因素.对不同基体材料初期沉积的观察发现,有些非晶态镀层的初期沉积中含有微晶.微晶的产生与否与基体材料以及镀层材料晶格的错配度有关,当镀层与基体材料点阵常数相差不大,镀层的初期沉积沿基体晶格外延生长出现微晶层,反之,点阵常数相差较大时,初期沉积物中未发现微晶. The initial process and mophology of electroless nickel played a domination role in adhesive strenghth of EN coating. The structure of initial deposits on certain matrixes was observed by TEM analysis. The deposition of a extremaly fine grain film depended on relative contrast between a coating and a matrix in crystal lattice parameters. When the coating and matrix had similar srystal lattice parameters. A extremely fine grain film was obtained. On the contrary, when the crystal lattice parameters were very different, a amorphous structure was observed.
出处 《电化学》 CAS CSCD 1997年第4期433-437,共5页 Journal of Electrochemistry
关键词 化学镀 沉积过程 镍磷合金层 镀镍 Electroless nickel, Amorphous, Initial process, Adhesive strenghth
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参考文献2

  • 1周绍民,金属电沉积.原理与研究方法,1987年,254页
  • 2冯端,金属物理学.1,1987年,408页

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