用Nicolet 60SXB FTIR光谱仪研究全氟磺酸树脂中的不稳定端基的热行为

INVESTIGATION OF THE THERMAL BEHAVIOUR OF UNSTABLE END-GROUPS IN PERFLUOROSULFACID RESIN BY NICOLET 60SXB FTIR SPECTROSCOPY

本文用付立叶变换红外光谱法研究了全氟磺酸树脂中不稳定端基的分解程度与热压成膜温度之间的关系,发现在全氟磺酸树脂的红外光谱中位于1812cm^(-1)处的游离的不稳定羧端基受热分解是造成树脂热压成膜产品中存在大量气泡的主要原因,而且当热压成膜温度增加时,1812cm^(-1)处吸收峰减小,而位于1776cm^(-1)处则产生一个新的吸收峰,两者之间有较好的规律性。同时还发现,树脂在热压成膜过程中存在着两个游离的不稳定端基之间的化合反应。

The dependence of the decomposed content of unstable end-groups in perfluorosulfacid resin on the temperature, at which the resin film was formed by heat press, was investigated by NICOLET 60SXB Fourier Transform Infrared Spectroscopy. It was observed that the major cause of a great number of gaseous bubbles existing in the heat pressed resin film is the thermal decomposion of the free and unstable end-groups -COOH at 1812cm^(-1) in the resin absorption spectrum, and that as the heat press temperature is elevated, the absorptance at 1812cm^(-1) reduces, a new absorption peak appears at 1776cm^(-1) in the spectrum, and these two tendencies are related very well. The existance of chemical combination is also observed between two free and unstable end groups during the formation of the resin film by heat press.