利用离子源掺铁制备多层类金刚石膜

Deposition of Fe Ion-Implanted Diamond-Like Carbon Multilayers

对离子源进行合理设计,使离子源中的Ar离子溅射产生Fe离子,利用裹挟Fe离子的Ar离子在制备类金刚石薄膜的过程中进行间歇性注入掺杂,制备多层类金刚石薄膜。这种多层类金刚石薄膜和单层类金刚石薄膜相比,应力从4.5 GPa降至3.9 GPa,摩擦系数从0.14降至0.1附近,同时保持硬度值不变。

A novel technique has been successfully developed to grow Fe ion implanted diamond-like carbon （DLC） multi-layers, with the modified linear ion sources （LIS）, on Si （100） substrates. The Fe impurity ions, generated in the specially designed ion source and accompanying the argon ions were implanted into one DLC layer previously grown by pulsed arc ion plating during argon ions sputtering and etching. The Fe-DLC multi-layers can be grown by alternating growth of DLC layer and Fe ion implantation. The microstructures and mechanical propertics of the Fe-DLC films were characterized with X-my photoelectron spectroscopy （XPS） and Raman spectroscopy. The results show that the Fe ion-implanted multilayer significantly improves its mechanical properties. As eompared with the conventional DLC films, its stress drops to 3.9 GPa from 4.5 GPa;its friction coefficient is down to 0.1 from 0.14,but its hardness remains unchanged.