磁过滤电弧离子镀TiN薄膜的制备及其强化机理研究

Hardening Mechanism of TiN Coating by Magnetic Filtered Arc Ion Plating

采用电弧离子镀(AIP)和磁过滤电弧离子镀(MFAIP)方法分别在不锈钢和硅片上制备了两种不同的TiN薄膜。利用扫描电镜(SEM)观察了薄膜的表面形貌及组织结构;利用X射线衍射(XRD)及透射电镜(TEM)进行相鉴定;用纳米力学测试系统(NHT)测量了薄膜的硬度。结果表明:MFAIP TiN薄膜具有强烈的(111)面择优取向,薄膜表面光滑、表面熔滴颗粒(MP)少、薄膜的柱状晶组织细小、致密,薄膜具有较高的硬度。并在此基础上讨论了薄膜的强化机理,认为磁过滤器是制备高质量TiN薄膜及其复合薄膜行之有效的一种方法,是今后制备高性能TiN及其复合膜的发展方向。

The TiN coatings were deposited by arc ion plating （All） and magnetic filtered arc ion plating （MFAIP） on stainless steel and silicon substrates, respectively. The microstmcmres and mechanical properties of the as=deposited TiN coatings were characterized with X-ray diffraction （XRD）, scanning electron microscopy （SEM）, transmission electron microscopy （TEM） and nano-indentation. The results show that the magnetic filtering significantly affects the microstmctures and surface hardndss of the TiN coatings. The TiN coatings,deposited by MFAll technique,has fmer grains with a preferential growth orientation of （111）, and its surface with few small bumps of melting droplets, is harder, smoother and more compact than that of the TiN coatings, deposited by AIP technique. We suggest that the fine crystal grains of the MFAIP coating are responsible for the increased surface hardness.