摘要
BEPCII has two rings each with an injection system. The injection system of each ring consists of two kicker magnets and a septum magnet. The injection layout of two rings is the same. Both two kickers would kick the beam in horizontal plane. The betatron phase advance in the horizontal plane between two kickers is designed exactly 180° in order to reduce the perturbation to the circulating beams during injection. In fact, the residual orbit oscillation will originate because of the existence of a variety of errors. The Librea Electron BPM processor is used to acquire the beam position data in turn-by-turn mode and to analyze the residual orbit oscillation. According to the measurement results, minimization of the residual orbit oscillation can be done by adjusting the peak field strength and trigger timing delay of two kickers. With very small residual orbit oscillation the two beams can keep collision condition during the injection.
BEPCII has two rings each with an injection system. The injection system of each ring consists of two kicker magnets and a septum magnet. The injection layout of two rings is the same. Both two kickers would kick the beam in horizontal plane. The betatron phase advance in the horizontal plane between two kickers is designed exactly 180° in order to reduce the perturbation to the circulating beams during injection. In fact, the residual orbit oscillation will originate because of the existence of a variety of errors. The Librea Electron BPM processor is used to acquire the beam position data in turn-by-turn mode and to analyze the residual orbit oscillation. According to the measurement results, minimization of the residual orbit oscillation can be done by adjusting the peak field strength and trigger timing delay of two kickers. With very small residual orbit oscillation the two beams can keep collision condition during the injection.
