摘要
研究直流磁控溅射中溅射功率对ＴｂＦｅＣＯ磁光薄膜成分均匀性、厚度均匀性、克尔旋转角θｋ和矫顽力Ｈｃ的影响。实验结果表明对于全金属互化物相（１００％ＩＭ）ＴｂＦｅＣｏ合金靶，若采用适当的溅射功率，不但能够实现高速率溅射，而且可获得较好的成分和厚度均匀性，同时溅射所得薄膜具有大的克尔旋转角和合适的矫顽力。此工艺参数被用于磁光盘的生产。
In this experiment,the effect of sputtering power on the properties of TbFeCo Magneto-Optical recording films was investigated. The results show that high sputtering rate good composition uniformity and thickness uniformity,big Kerr rotation angle and suitable coercive force can be obtained when sputtering power is suitable. As a result,the optimized sputtering parameters have been used for manufacturing Mo disks.
出处
《真空电子技术》
1997年第6期43-45,48,共4页
Vacuum Electronics
关键词
磁光薄膜
溅射功率
磁光记录技术
TbFeCo magneto-optical films
Properties
Sputtering power
