摘要
同步辐射X射线光刻是一种很好的深亚微米图形复制技术。本文报道了北京同步辐射装置3BlA光刻束线上的曝光结果，并对X射线掩模的制作工艺作了简要介绍。
Synchrotron radiation x-ray lithography is a promising technique for replication of deep sub-micron pattern. Some exposure experiment results finished inBeijing Synchrotron Radiation Facility 3B1A beamline are reported in this paper,and the fabrication process of x-ray mask is also introduced briefly.
出处
《微细加工技术》
1997年第3期10-13,共4页
Microfabrication Technology
基金
军用微电子重点预研资助
