离子束溅射原位淀积高温超导薄膜的机理与实验研究

MECHANISM AND EXPERIMENTAL INVESTIGATION OF ION BEAM SPUTTERING OF IN SITU DEPOSITED HIGH TEMPERATURE SUPERCONDUCTING FILMS

理论计算了氩离子束溅射Y－Ba－CU－O靶的组分原子溅射率，得出了溅射过程中存在Cu原子溅射率偏低的“择优溅射”效应。通过分析原位形成高温超导薄膜的实现条件，表示出了离子束溅射原位成膜的基本过程。实验上采用分子氧辅助淀积技术，用离子束溅射法原位外延出YBa2Cu3O(7-δ)超导薄膜。讨论了实验条件对薄膜特性的影响。所得到的实验结果与理论分析相一致。

Atomic sputtering yields of film compositions from a Y-Ba-Cu-O target bombarded by argon ions have been calculated, and there exists preferred effect with smaller copper atomic sputteiing yield. during process of sputtering Through analysis of realization conditions of in situ high temperature superconduction films, process in relation of in situ films formation by ion beam sputtering has been shown. Experimentally, YBa,Cu3O7-σfilms epitaxied by in situ ion beam sputtering was achieved by means of a molecular oxygen auxiliary deposition. The influence of experimental conditions on the film characteristics was discussed. Our experimental results were in accord with the theoretical analysis.