非晶碳-聚酰亚胺复合薄膜的场致电子发射预击穿现象研究

Prebreakdown Observed by Field Electron Emission Experiments from Amorphous Carbon-polyimide Composite Films

利用脉冲激光沉积技术（ＰｕｌｓｅｄＬａｓｅｒＤｅｐｏｓｉｔｉｏｎ）首次制备出非晶碳－聚酰亚胺复合薄膜，用其做为冷阴极，观察到其场致电子发射的预击穿现象，预击穿后阈值场强为７Ｖ／μｍ，最大发射电流密度为１．２ｍＡ／ｃｍ２。利用透明导电薄膜阳极技术可观察到电子在薄膜阴极表面的发射区域。用扫描电子显微镜（ＳＥＭ）观察了预击穿后发射区域的表面形貌的变化，并对复合薄膜的预击穿现象和场电子发射机理进行了探讨。该复合薄膜可能作为一种新型的场发射冷阴极，在平面显示器件中得到应用。

Prebreakdown was observed under field electron emission experiments from amorphous carbon-polyimide films which were firstly deposited on silicon substrate with high electrical conductivity by pulse laser deposition.Lower turn-on electrical field of 7V/μm and higher current density of 1.2mA/cm 2 was obtained.The locations of electron emission sites were observed using transparent conducting anode techanique and then the corresponding surface microstructure of electron emission locations on film cathode and the emission mechanism could be futher studied.The composite films could be competent as a new cold emitter applied in flat panel display(FPD).