铁基基体化学气相沉积TiN的机理

Deposition Mechanisms for Chemical Vapour Depositioon of TiN Deposited on Iron-Basis Substrates

本文研究了在低碳钢、T10钢和Cr12MoV钢基体上,在由表面过程控制的沉积条件下,CVD法沉积TiN的机理;测出了在这些基体上,用CVD法沉积TiN的表面过程表观活化能和铁的催化反应的表观活化能;确定了铁的催化反应的限制性环节是铁在TiN涂层表面的扩散步骤;提出并讨论了T10钢和Cr12MoV钢基体CVDTiN的沉积机理的转变温度。

The mechanisms for chemical vapour deposition of TiN deposited on low carbon steel substrate, T10 steel substrate and Cr12MoV steel substrate under surface process limiting conditions were studied in this paper. The apparent activation energies of chemical vapoar deposition TiN deposited on these substrates and the apparent activation energies of Fe catalytic reaction were measured. The step of Fe surface diffusion on TiN coating surface was determined to be the limitiug step of the Fe catalytic reaction. A transformation temperature of the deposition mechanism for chemical vapour deposition of TiN deposited on T10 steel substrate and Cr12MoV steel substrafe was proposed and discussed.