摘要
本文从理论上推导出,铁基基体化学气相沉积(CVD)TiN总沉积反应的表面过程表观活化能E_3、来自气相的反应物生成TiN反应的表面过程表观活化能E_1,和来自气相及基体的反应物生成TiN反应的表面过程表观活化能E_2的关系式,E_3=λ_1·E_1+λ_2·E_2;计算出T10钢和Cr12MoV钢基体CVDTiN,来自气相及基体的反应物生成TiN反应的表面过程表观活化能E_2,分别是199.8和192.3kJ/mol;用这关系式,解释了作者最近获得的一些实验结果。
A theoretical relation for chemical vapour deposition of TiN de- posited on an iron-basis substrate under surface process limiting conditions was derwed in this paper. The relation between the apparent activation energy E_3 of the total TiN deposition reaction, the apparent activation energy E: of the producing TiN reaction in which an the reactants come from the gas phase, and the apparent activation energy E_2 of the producing TiN reaction in which the reactants come from the gas phase and the subst- rate is E_3=λ_1·E_1+λ_2·E_2. The relation was used to evaluate the apparent activation energies (E_2) when T10 steel and Cr12MoV steel were used as the substrates. They are 199.80 and 192.28 kcal/mol respectively. The relation was also used to in terpret the latest experimental results ob- tainde by the author.
关键词
氮化钛
表观活化能
化学气相沉积
Aparent activation energy
Chemical vapour deposition (CVD)
Titaniuns Nitride