有机玻璃基材表面电子束蒸镀铬-铝-二氧化硅薄膜及其性能研究

Characteristics of chromium-aluminum-silicon dioxide thin films deposited on PMMA glass substrate by electron beam evaporation process

采用电子束蒸镀的方法,以有机玻璃为基材,在其表面蒸镀铬过渡层,再蒸镀铝,最后蒸镀保护层二氧化硅。实验结果表明:增加铬过渡层的样品,铝膜结合的非常牢固,附着力得到很大的提高。和未蒸镀二氧化硅保护层的样品进行耐腐蚀性测试对比,发现二氧化硅薄膜具有很好的保护性,铝膜在10%的碱性溶液中完好无损;而没镀二氧化硅保护层的样品,铝膜很快溶解。试验结果表明,采用电子束蒸发技术,在使用合适的工艺参数下,可以在有机玻璃表面制备附着力好、耐腐蚀的高反射铝膜。

The chromium, aluminum and silicon dioxide layers were sequentially deposited on the PMMA （polymethylmethacrylate） glass as substrate by electron beam evaporation process. The results showed that the samples with Cr transition layer improve greatly the adhesion of A1 in comparison with the samples without Cr layer. The corrosion resistance test results showed that the SiO2 layer deposited on A1 layer enables A1 layer to have higher anti-corrosion property in comparison with that no SiO2 layer deposited. It was proved that the A1 layer with SiO2 layer deposited on it can keep intact in 10% alkaline solution but will rapidly dissolved in alkali solution if no SiO2 layer deposited on it. All the results revealed that the highly adhensive anticorrosive A1 thin films with high reflectivity are available by electron beam evaporation with appropriate process parameters chosen.