软 X 射线接触式显微术抗蚀膜显影条件分析

Development Conditions of Resist in Soft X Ray Contact Microscopy

按照生物样品各分辨单元具有多种透过率的特点，设计了一个多衬度的台阶状蛋白质模型，模拟各台阶的真实成像条件，测量了各台阶所对应的抗蚀膜显影速率曲线，对显影条件作了定量分析，并将显影条件与分辨率紧密结合起来，找到了一种较好的定量确定显影条件的方法。

Different resolution pixels have a series of transmission coefficient,according to this feature of biological specimen,we device a protein model with several different high steps,calculate the resist exposure corresponding to every step,after exposure,measure the resist development speed,analyse the development condition quantitatively,find out a better method to control development condition,especially connect resist development with resolution closely.