摘要
用透射电镜(TEM)观察了采用直流磁控溅射法制备厚度在1.5 nm^67 nm之间的半连续Ag膜的形貌。对TEM显微图像,提出了利用小波变换消除显微图像中的低阶趋势项,然后用多重分形谱来定量表征不同厚度半连续Ag膜的复杂微结构特征。结果显示,多重分形谱的宽度(Δα)、顶点位置都会随着膜的厚度变化有规律地变化。这种方法表征了不同条件下薄膜的形成机理,为探索薄膜微结构的制备条件提供了重要的理论依据。
The topography of semicontinuous Ag films with thickness from 1.5 nm to 67nm deposited by DC magnetron sputtering was measured with a transmission electron microscope （TEM）. We propose to analyze the TEM image firstly, then, we quantitatively their structural topography of microscope image of semi-continuous Ag films with multi- fractal spectrum. Experimental results show that the multi-fractal spectrum width（Δα）, top place are changed regularly with the thickness of semi-continuous Ag films. This mode can express quantitatively the forming mechanism of the films, and offer an important theory for researehing forming condition of the films.
出处
《电子测量技术》
2008年第9期6-9,13,共5页
Electronic Measurement Technology
基金
安徽省教育厅自然科学基金(2005KJ058)项目资助
关键词
显微图像
小波变换
消除低阶趋势项
多重分形谱
microscope image
wavelet transform
low rank signal detrended
multi-fractal spectrum
