薄膜生长的三维元胞自动机模拟

3-D Cellular Automata Simulation of Thin Film Growth

结合元胞自动机和蒙特卡罗方法建立了模拟三维薄膜生长的计算机模型。通过计算机仿真实验,研究了薄膜生长过程中沉积速率和沉积温度等对薄膜表面形貌的影响。研究结果表明:在相同温度下和较低的沉积速率范围内,薄膜粗糙度几乎不随沉积速率发生变化;随着沉积速率的逐步升高,薄膜粗糙度将逐渐增大;在相同沉积速率时,薄膜粗糙度随沉积温度的升高达到一个最小值,之后粗糙度又将随温度升高而增加,这说明并非沉积温度越高薄膜粗糙度越低,模拟结论与实际情况相符。

In this paper, a computer simulation model of film growth in three dimensions is established, based on cellular automata and Monte Carlo methods. The effect of the deposition rate and deposition temperature on the surface morphology of film is investigated with the computer simulation model. The relationship between the roughness and covering rate of film under different conditions is studied in detail. The results demonstrate that at the same deposition temperature, when the deposition rate is low, the roughness of film does not change with the increase of the deposition rate. However, the roughness of film will rise with the increase of the deposition rate further. Especially, when the deposition rate is the same, the roughness of film will reach a minimum value and then increase with increase of the deposition temperature. Therefore, it can be concluded that the roughness of film does not rise with the increase of the deposition rate, which is in accordance with the real situation.