埋氧沟槽栅双极模式JFET的仿真与实验(英文)

Simulation and Experiment on a Buried-Oxide Trench-Gate Bipolar-Mode JFET

提出了埋氧沟槽栅双极模式JFET(BTB-JFET),其在栅极区域下面添加埋氧以减小栅漏电容Cgd.首次通过仿真对包括BTB-JFET、常规的无埋氧层的沟槽栅双极模式JFET(TB-JFET)和现在正在广泛应用的Trench-MOSFET(T-MOSFET)等20V级的功率开关器件在高频应用时的功率损耗进行了比较,得到有重要意义的结论.采用阻性负载电路.仿真结果表明,与T-MOSFET和常开型TB-JFET相比,常开型BTB-JFET在1MHz时开关功耗分别降低了37%和14%.进行实验以证明仿真工作的合理性,首次成功地制造出常开型BTB-JFET和TB-JFET,其中埋氧结构是通过热氧化的方法实现的.实验结果表明,与TB-JFET相比,在源漏零偏压时,BTB-JFET的Cgd减小了45%;在1MHz时,其开关时间与开关功耗分别降低了约7.4%和11%.因此常开型BTB-JFET应是今后低压高频功率开关器件的研究发展方向.

A buried-oxide trench-gate bipolar-mode JFET （BTB-JFET） with an oxide layer buried under the gate region to reduce the gate-drain capacitance Cgd is proposed. Simulations with a resistive load circuit for power loss comparison at high frequency application are performed with 20V-rated power switching devices,including a BTB-JFET,a trench MOSFET （T-MOSFET） generally applied in present industry, and a conventional trench-gate bipolar-mode JFET （TB-JFET） without buried oxide,for the first time. The simulation results indicate that the switching power loss of the normally-on BTB-JFET is improved by 37% and 14% at 1MHz compared to the T-MOSFET and the normally-on TB-JFET, respectively. In order to demonstrate the validity of the simulation, the normally-on TB-JFET and BTB-JFET have been fabricated successfully for the first time, where the buried oxide structure is realized by thermal oxidation. The experimental results show that the Cgd of the BTB-JFET is decreased by 45% from that of the TB-JFET at zero source-drain bias. Compared to the TB-JFET,the switching time and switching power loss of the BTB-JFET decrease approximately by 7. 4% and 11% at 1MHz,respectively. Therefore,the normally-on BTB-JFET could be pointing to a new direction for the R＆D of low volt- age and high frequency switching devices.