摘要
采用等离子体增强化学气相沉积类金刚石(DLC)薄膜、高真空磁控溅射镀膜设备溅射Ag靶的方法制备了不同厚度Ag、DLC层的DLC/Ag/DLC多层膜,分别用紫外可见分光光度计、四探针测试仪对样品的光学性能、电学性能进行了测试。结果表明,随着Ag层厚度的增加,DLC/Ag/DLC多层膜透射率先增后减,外层DLC薄膜和内层DLC薄膜对透射率影响基本一致,随着厚度增加透射率先增后减,在内外层厚度为40 nm,Ag夹层厚度为16 nm时,DLC(30 nm)/Ag(16 nm)/DLC(40 nm)膜在550 nm处的透射率高达94.4%,电气指数高达112.4×10-3Ω-1,远远超过现有透明导电膜的电气指数(FTC≈20×10-3Ω-1)。
DLC/Ag/DLC multilayer films with different Ag and DLC thickness were prepared with high-vacuum magnetron sputtering. DLC layers were prepared by plasma enhanced chemical vaporation deposition method. The optical and electrical properties of samples were studied with a UV-vis pectrophotometer and a four-point probe, respectively. The results indicate that with the increase of the thickness of the Ag layer, the transmittance firstly increases and then decreases. With the increase of the thickness of the inner or outer DLC layer, the transmittance also firstly increases and then decreases. With the thickness of multilayer films up to DLC(30 nm)/Ag(16 nm)/DLC(40 nm), the film has a high optical transmittance of 94.4% at 550 nm and the electrical index is up to 112.4× 10^-3 Ω^-1 which is much higher than that of the existing transparent optical conducting films (F≈TC20 ×10^-3 Ω^- 1).
出处
《光学学报》
EI
CAS
CSCD
北大核心
2008年第10期2031-2035,共5页
Acta Optica Sinica
关键词
薄膜光学
光学性能
多层膜
光学透射率
电气指数
磁控溅射
thin film optics
optical properties
multilayer films
optical transmittance
electrical index
magnetron sputtering