期刊文献+

具有纳米级结构出光面的AlGaInP基发光二极管 被引量:7

Nano-structured surface fabrication for AlGaInP light emitting diodes
原文传递
导出
摘要 研究了一种利用金属自组装纳米掩膜和ICP刻蚀对AlGaInP基发光二极管(LED)表面进行粗化的技术,使光输出得到了提高。粗化了的AlGaInP基LED比常规的AlGaInP基LED,光强提高了27%,光功率提高了12.6%,实验结果具有可重复性。可以进一步优化Au颗粒的周期和分散程度,提高AlGaInP基LED的提取效率。 The self-assembled nanostructure metal is proposed as the masks, then the surface of AlGaInP light emitting diodes (LED) is dry-etched to be roughened. The roughened surfaces-increase the light-output. The light intensity and light power of roughened AlGaInP LEDs increase by 27 % and 12.6 % respectively compared with normal AlGaInP LEDs. By optimizing the period and separation of metal masks,the light-output will be further increased.
机构地区 北京工业大学
出处 《光电子.激光》 EI CAS CSCD 北大核心 2008年第10期1301-1303,共3页 Journal of Optoelectronics·Laser
基金 国家“973”计划资助项目(2006CB604902) 国家“863”计划资助项目(2006AA03A121) 北京市人才强教计划资助项目(05002015200504)
关键词 表面粗化 金属纳米掩膜 干法刻蚀 surface roughing metal nanograde masks dry etching
  • 相关文献

参考文献4

二级参考文献50

  • 1申屠伟进,胡飞,韩彦军,薛松,罗毅,钱可元.GaN基发光二极管芯片光提取效率的研究[J].光电子.激光,2005,16(4):385-389. 被引量:20
  • 2赵透玲,任丙彦,赵龙,王文静.射频磁控溅射ITO薄膜中沉积温度对膜特性影响[J].光电子.激光,2005,16(12):1429-1432. 被引量:13
  • 3刘敬伟,王刚,马丽,张凯亮,张丽蕾,王庆江,万丽芳.大尺寸液晶电视用LED背光源的设计与制作[J].液晶与显示,2006,21(5):539-544. 被引量:36
  • 4冯道宁,王念春.地铁列车LED显示屏的设计[J].液晶与显示,2007,22(1):99-103. 被引量:10
  • 5[1]Kato T, Susawa H, Hirotani M, et al. GaAs/GaAlAs surface emitting IR led with bragg reflector grown by MOCVD [J]. J Cryst Growth, 1991, 107: 832.
  • 6[2]Ishikawa M, Shiozawa H, Itaya K, et al. Temperature dependence of the threshold current for InGaAlP visible laser diodes [J]. IEEE J Quantum Electron, 1991, 27: 23-29.
  • 7[3]Yablonovitch E, Huang D M, Gmitter T J, et al. Van der waals bonding of GaAs epitaxial liftoff films onto arbitrary substrates [J]. Appl Phys Lett, 1990, 56: 2419.
  • 8[4]Schnitzer I, Yablonovitch E, Caneau C, et al. Ultrahigh spontaneous emission quantum efficiency, 99.7% internally and 72% externally from AlGaAs/GaAs/AlGaAs double heterostructures [J]. Appl Phys Lett, 1993, 62: 131.
  • 9[5]Adachi S, Oe K. Chemical etching characteristics of (001)GaAs [J]. J Elcetrochem Soc, 1983, 130: 2427.
  • 10[6]Liau Z L, Mull D E. Wafer fusion: A novel technique for optoelectronic device fabrication and monolithic integration [J]. Appl Phys Lett, 1990, 56: 737.

共引文献34

同被引文献41

引证文献7

二级引证文献32

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部