稳恒磁场下CuCo颗粒膜电沉积制备与巨磁电阻效应

Giant Magnetoresistance of CuCo Granular Films Electrodeposited in Magnetic Field

在稳恒磁场下电沉积制备了CuCo功能膜材料.用SEM和XRD对镀层组分、微观结构进行观察和分析,并测量了膜层的巨磁电阻效应.颗粒膜的组成随磁场强度变化而改变,0.6～0.8T下沉积的膜层中Co含量较高,更强磁场反而抑制了Co的沉积.施加磁场能使膜层晶粒更加致密,0.6T磁场下制备的膜层晶粒较小,并使膜层(111)晶面择优取向增强.磁阻测试表明,0.6T磁场下制备的CuCo颗粒膜经真空退火处理后,巨磁电阻较无磁场下提高约25%.

CuCo granular film was prepared by electrodeposition in the stable magnetic field. Scanning electron microscope and XRD were used to examine the composition and structure of plated films. The giant magnetoresistance of the films was measured by the four-line method. The magnetic field could affect the composition of the granular film, the concentration of Co was higher under 0.6,-0.8 T, and when the intensity of magnetic field was over 0.8 T, the concentration of Co would decrease. The crystal grains were refined under the magnetic fields. The optimal intensity of magnetic field was 0.6 T, under which the crystal grains of films were more compact, and the orientation of crystal plane （111） was promoted. The measurement result showed that the magnetoresistance of CuCo granular film Dreoared in 0.6 T increased 25% than that prepared without magnetic field after vacuum annealing.