磁控溅射基片低温冷却法制备NiOx纳米微晶薄膜

Preparation of nano-microcrystalline NiO_x films by magnetron sputtering and cooling substrates

利用自行设计的基片液氮低温冷却装置,用金属Ni靶在Ar+O2气氛反应条件下,利用磁控溅射制备纳米微晶结构NiOx膜的方法,薄膜的XRD谱和扫描电子显微图像(SEM)表明,该方法实现了在溅射参数完全相同的条件,纳米NiOx薄膜结构连续可控、可调节。

In this paper,it is introduced that using a cooling apparatus based on liquid nitrogen,we have prepared NiOx films with nano-microcrystalline structure by reactive magnetron sputtering. X-ray diffiration（XRD） and Images of scanning electron microscope（SEM）demonstrate that when we employ equal sputtering parameters, using this method,we can effectively regulate or control grain size of NiOx films with nano-microcrystalline structure.