多相体系中非晶态二氧化硅的X射线衍射定量分析

QUANTITATIVE ANALYSIS OF AMORPHOUS SILICA IN MULTICOMPONENT SYSTEM BY XRAY DIFFRACTION

本文提出了应用Ｘ射线衍射测定多相体系中非晶态二氧化硅含量的新方法。认为应用基体清洗法及其演化而成的自清洗法对多相体系中非晶态二氧化硅含量的测定仍然是有效、可行的。通过实验测定非晶态二氧化硅相对石英０．４２５ｎｍ参比衍射线的Ｋ值为０．２９３；并推导出多相体系中非晶态二氧化硅的含量表达式。

A new method for determining content of amorphous silica in multicomponent system by using Xray diffraction is suggested. It is efficacious and feasible for using MatrixFlushing and Adiabatic priciple to test the content of amorphous silica in multicompoent system. After experiment tested, K value of amorphous silica relatively to 0.425 nm Xray diffraction line of quartz is 0.293. We also deduced content formula of amorphous silica in multicomponent system.