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掺铜对DLC膜力学性能影响研究 被引量:7

Study on the Mechanical Properties of DLC Films Doped with Cu
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摘要 利用纯铜靶作脉冲阴极,并改变碳阴极的数量或在铜靶前设置栅网调节DLC膜中铜含量,制备了不同铜含量的几组样品。研究发现,随着铜含量的增加,薄膜的硬度和应力下降;但当铜原子百分比含量大于6.3%时,薄膜的硬度和应力基本保持不变。摩擦因数随着铜含量的增加,一直缓慢增加,并且磨损量也慢慢增加。 Samples with different Cu concentration were prepared by using pure Cu target and changing the number of graphite target, or adding a grid before the Cu target to adjust Cu concentration in DLC thin films. The results show that the hardness and stress decreases with an increase of Cu concentration (below 6.3 at.%). When Cu concentration increases from 6.3 at.% to 17.8 at.%, the hardness and stress keep almost constant, and the friction coefficient increases gradually and slowly, so for the wear loss.
出处 《中国表面工程》 EI CAS CSCD 2008年第5期38-42,共5页 China Surface Engineering
关键词 类金刚石膜 掺铜 应力 硬度 DLC films Cu-doped stress hardness
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参考文献11

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