微波ECR等离子体溅射沉积TiN薄膜的研究

Study of TiN Thin Film by Microwave ECR Plasma Reaction Sputtering Deposition

用微波电子回旋共振（ＥＣＲ）等离子体溅射法在常温下制备出优质的ＴｉＮ薄膜．采用静电探针技术，对ＥＣＲ等离子体进行了诊断，研究了等离子体参数与装置运行参数之间的关系，探讨了等离子体参数对成膜工艺过程的影响．

This paper reports on using microware ECR plasma sputtering method prepared high quality TiN films on low-temperature substrates. Plasma diagnotic in ECR plasma apparatus has been made by longmuir probe technique. The relationship between plasma paremeters and apparatus operation paremeters have been studied. The infuences of plasma paremeters to deposition thin film processed are explorated.