离轴照明下依赖于入射角度的矢量霍普金斯公式

Vectorial Hopkins formulation depending on angles of off-axis illumination

应用矢量电磁场理论和波导模型推导出离轴照明下的矢量霍普金斯公式,与传统的标量霍普金斯公式不同之处在于引入了入射角及入射方位角.通过仿真实际投影光刻工艺下三维掩模的成像效果,分析了最佳入射角范围,讨论了离轴照明时入射角对最终成像质量的影响.

Basing on vector electromagnetic theory and the waveguide model,the vectorial Hopkins formula is deduced.It containes incidence angle and azimuth angle of off-axis illumination,which is different from the traditional scalar Hopkins formula.By simulating the aerial image of the three dimensional mask in actual lithography process,the optimal angular range of oblique incidence is analyzed,and the impact of oblique incidence angle on imaging quality is also discussed.