期刊文献+

工业磷酸中As(Ⅲ)的电化学沉积 被引量:2

Electrodeposition of As(Ⅲ) in technical grade phosphoric acid
下载PDF
导出
摘要 运用恒电流法在铜柱电极上研究了工业磷酸中毒性较大的As(Ⅲ)还原为无毒单质砷的电化学行为。实验表明,当电流密度控制在-0.044 mA/cm2以内时可以很好地将As(Ⅲ)转化为单质砷并抑制砷化氢析出。由塔费尔拟合推算得到As(Ⅲ)转化为单质砷的交换电流密度为-6.324×10-7mA/cm2,此过程为不可逆过程。采用表面积为15.8 cm2的铜柱电极,在电流密度为-0.038 mA/cm2,温度为80℃条件下,将磷酸中As(Ⅲ)含量由10.92×10-6降到0.47×10-6,电流效率达7.55%。 Electrodeposition of As( Ⅲ ) in the technical grade phosphoric acid was studied on copper cylinder electrode by the constant current method and the aim was to remove the arsenic in phosphoric acid. In this process, the oxidation state and toxic As(Ⅲ) was reduced to nontoxic element arsenic. The results showed that As(Ⅲ )was reduced to As efficiently without releasing toxic AsH3 under the condition of current density i = - 0.044 mA/cm^2. The Tafel plot analyses reveal that the eleetrodeposition of arsenic is a totally irreversible electrode reaction and the exchange current density is i0 = -6. 324×10^-7 mA/cm^2. The concentration of As(Ⅲ) in phosphoric acid was reduced to 0.47×10^-6 from 10.92×10^-6 at current density j = -0.038 mA/cm^2 and temperature T = 80℃. The current efficiency for arsenic was 7.55%.
出处 《应用化工》 CAS CSCD 2008年第10期1121-1124,共4页 Applied Chemical Industry
基金 国家科技支撑计划课题(2007BA08B09) 绿色化工过程省部共建教育部重点实验室开放研究基金(GCP200804)
关键词 砷化氢 铜柱电极 电流密度 电流效率 交换电流密度 As ASH3 copper cylinder electrode current density current efficiency exchange current density
  • 相关文献

参考文献14

二级参考文献14

  • 1邱德良,刘焕安,赵成永.DS-1高硅奥氏体不锈钢板内衬硫酸干吸塔[J].硫酸工业,2005(1):26-29. 被引量:7
  • 2于慧生.湿法磷酸的精制技术[J].无机盐工业,1984,(6):12-16.
  • 3武贵先.湿法磷酸的净化方法[J].磷酸盐工业,1988,(3):4-12.
  • 4GB2091-80.磷酸[S].[S].,..
  • 5DouglasC Montgomery著 王仁官 陈荣昭译.实验设计与分析[M].北京:中国统计出版社,1998..
  • 6化工商品检验手册编委会.化工商品检验手册[M].北京:化学工业出版社,1996.453-456.
  • 7ARNOLD J P,JOHENSON R M.Polaragraphy of Arsenic[J] .Talanta, 1969,(16):1191-1207.
  • 8秦毅红.As(Ⅱ)在酸性氯化物溶液中的电化学行为的研究[A].全国第二届湿法冶金学术会议论文集[C].昆明:昆明理工大学出版社,1991.558-563.
  • 9MENZIES I A , OWEN L W. The Electrodeposition of Arsenic From Aqueous and Non-aqueous Solutions[J]. Electrochimica Acta.1966, (11) :251-265.
  • 10杨显万,邱定蕃.湿法冶金[M].北京:冶金工业出版社,1980.

共引文献37

同被引文献16

  • 1BELABBES A, ZAOUI A, FERHAT M. Alloying effect in the III-As-Sb ternary systems[J]. Materials Science and Engineering B, 2007, 137: 210-212.
  • 2DINAN T E, JOU W F, CHEH H Y. Arsenic deposition onto a gold substrate[J]. J Electrochem, 1989, 136: 3284-3287.
  • 3JIA Zheng, SIMM A O, DAI Xuan, COMPTON R G. The electrochemical reaction mechanism of arsenic deposition on an Au(111) electrode[J]. Journal of Electroanalytieal Chemistry, 2006, 587: 247-253.
  • 4WEI Z, SOMASUNDARAN E Cyclic voltammetric study of arsenic reduction and oxidation in hydrochloric acid using a Pt RDE[J]. Journal of Applied Electrochemistry, 2004, 34: 241-244.
  • 5BE JAN D, BUNCE N J. Electrochemical reduction of As(Ⅲ) and As(Ⅴ) in acidic and basic solutions[J]. Journal of Applied Electrochemistry, 2003, 33: 483-489.
  • 6BRUSCIOTTI F, DUBY P. Co-deposition of arsenic and arsine on Pt, Cu, and Fe electrodes[J]. Electrochemistry Communications, 2008, 10: 572-576.
  • 7NAYAK J, SAHU S N. Effect of synthesis temperature on the structure and optical properties of electro-chemically grown GaAs nanocrystals[J]. Physica E, 2008, 41: 92-95.
  • 8NAYAK J, SAHU S N. Orthorhombic-phase GaAs nanoparticles prepared by an electrochemical technique[J]. Applied Surface Science, 2004, 229: 97-104.
  • 9CATTARIN S, MUSIANI M M, CASELLATO U, GUERRIERO P, BERTONCELLO R. Cathodic deposition of ternary In+As+Sb alloys and formation of InAsxSb1-x[J]. Journal of Electroanalytical Chemistry, 1995, 308: 209-218.
  • 10BERTONCELLO R, GLISENTI A, GRANOZZI G, MUSIANI M M. Angle-resolved X-ray photoelectron spectroscopy contribution to elucidation of the mechanism of cathodic deposition of As-Sb alloys[J]. Journal of Electroanalytical Chemistry, 1994, 374: 37-43.

引证文献2

二级引证文献4

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部