摘要
综合考虑了工件表面原子的微观状态,利用纳米颗粒特殊的高比表面能和高吸附特性,提出了一种可实现工件表面原子级去除的纳米胶体射流抛光方法。利用碱性胶体中纳米颗粒与工件的表面反应,设计了可实现超精密表面加工的纳米胶体射流抛光系统,并利用该系统对K9玻璃进行抛光。试验结果表明,纳米胶体射流抛光可实现超精密光学表面的抛光,抛光后表面粗糙度Ra小于1nm。
Studied the micro structure of work surface atoms, the high surface energy and intense adsorption of SiO2 nanoparticle. For producing ultra-precision surface, a nanopartiele colloid jet machining system was designed and manufactured where the reversible polymerize and decompose reaction was utilized to remove surface atoms. We employed the system to polish a K9 glass sample, some recent experiments prove that it is possible to fabricate ultra-precision in nanoparticle colloid jet machining. The microroughness of the work surface processed by nanoparticle colloid jet machining is under 1nm Ra.
出处
《中国机械工程》
EI
CAS
CSCD
北大核心
2008年第21期2521-2524,共4页
China Mechanical Engineering
基金
国家自然科学基金资助项目(50375040
50805039)
高等学校博士学科点专项科研基金资助项目(新教师基金)(20070213049)
中国博士后科学基金资助项目(20070410899)
哈尔滨工业大学科研创新基金资助项目(HIT.NSRIF.2008.40)
关键词
超精密加工
纳米胶体射流加工
抛光
纳米颗粒
ultra-precision machining
nanoparticle colloid jet machining
polishing
nanoparticle colloid
