摘要
研究了电镀液组分和工艺控制参量对Fe-50%Ni合金簧片An-Rh配套镀层显微组织、性能的影响。工艺优化结果表明:采用2#镀铑液,控制镀轮时的电流密度0.6A/dn2、时间8min、温度50℃,可获得显微组织呈颗粒状均匀致密分布、无明显龟壳状裂纹的优良Au-Rh配套镀层。
The influence of the composition and concentrations of plating bath as well as process-ing variables on micrographs and properties of Au-Rh deposition on the Fe-50%Ni alloy base isinvestigated. It is shown that better Au-Rh deposition with well distributed fine grain mi-crostructure and without obvious tortoise-shell-like crack can be obtained by using No. 2 Rhodi-um's plating bath with processing variables conducted at 0. 6 A/dm2, 8min, 50℃.
出处
《西安理工大学学报》
CAS
1997年第4期351-355,共5页
Journal of Xi'an University of Technology
关键词
电镀工艺
电镀应力
继电器
簧片
金-铑电镀
plating process micrograph tortoise-shell-like crack plating stress