化学气相沉积TiN薄膜及其耐磨性能

Preparation and Wear-resistant Properties of TiN Films by CVD

采用化学气相沉积的方法制备TiN薄膜,以提高K3镍基高温合金的耐磨性能。以TiCl4和NH3为反应气体,用化学气相沉积法(CVD)在K3镍基高温合金基体上制备了一系列不同温度和沉积时间的TiN薄膜。结果表明,与基体相比,沉积TiN薄膜的样品耐磨性能有显著提高。当沉积温度不变时,TiN薄膜耐磨性能随沉积时间的延长先提高后降低;当沉积时间不变时,薄膜的耐磨性能随沉积温度的升高而提高。化学气相沉积法制备TiN薄膜的最佳工艺条件为600℃/60min。

In order to improve the wear-resistance of K3 Ni-based super alloy,TiN coating is deposited by chemical vapor deposition （CVD） method at different temperatures and deposite times. The reactant gas is TiCl4/NH3. Results show that the wear-resistance of the alloys deposited with TiN is greatly improved compared with those alloy without TiN films. At a set deposition temperature,the wear resistance of TiN coatings becomes better at first and then decreases with increasing deposition time. With the same deposition time,the wear-resistance becomes better and better with the increasing of temperature .The best deposition condition is obtained at 600 ℃/60 min.