氮化锡负极薄膜的制备与性能研究

Preparation and property study of the tin nitride negative electrode thin film

氮化锡是一种新型薄膜锂电池负极材料,采用射频反应磁控溅射法制备氮化锡负极薄膜,系统研究了反应溅射功率和气流比对氮化锡薄膜结构的影响,并对其充放电性能进行了研究。实验结果表明,在溅射功率75W,N2/(N2+Ar)流量比0.5的条件下所制备氮化锡薄膜结晶度较好,表面致密具有良好的电性能,首次充放电效率超过60%,50次循环后放电比容量仍保持250mAh/g。

Tin nitride is a new kind of the negative electrode materials used for thin film lithium batteries. The tin nitride thin film was obtained by radio-frequency reactive magnetron sputtering methods. The influence of varying radio-frequency power and reactive gas composition on the structure of the tin nitride thin films was wholly investigated and the electrochemical performance of the films were also studied. The experiment results show that the tin nitride thin films prepared at RF power 75 W, N2/（N2＋Ar） ratio 0.5, has high degree of crystallinity. And the tin nitride thin films has a compact surface and good electrochemistry performance： the first charge-discharge efficiency is over 60% and the specific discharge capacity for 50 cycles is 250 mAh/g.