低温纳米压印技术制备微纳图案的研究

Research on Micro/nanopattern Fabrication based on Nanoimprint Lithography at Low Temperature

纳米压印需要将聚合物加热到它的玻璃化温度以上,然后用印章压印使其复制印章图案。采用低玻璃化温度的SU-8 2000.1和Hybrane胶体转移图案,能够在低温、甚至室温下实现微纳图案的转移。采用的印章制备方法是聚焦离子束(FIB)直接在衬底上制备图案,从而避免了传统工艺中效率较慢的电子束加工和取消了反应离子刻蚀步骤;并且采用FIB方法可同时在衬底上制备微米、纳米尺度的图案。实验结果表明用FIB方法可以得到比较均匀致密的微纳米图案印章,经过低温纳米压印后可成功地实现微纳图案的复制。

Nanoimprint replicates patterns by using a stamp to imprint polymer when the polymer heated beyond its glass transistion temperature （Tg）. Novel polymers SU - 8 2000.1 and Hybrane were employed to transfer patterns. They can be used to replicate pattterns at low temperature,even with room temperature. At the same time,new imprint stamp fabrication mehod using focused ion beam（FIB） to directly etch substrate was researched. It replaced the traditional e - beam method and cancelled the HIE step. Another advantage is that the FIB method can fabricate the micron and nano sized patterns at the same stamp. The experimental result demonstrates that FIB fabricated stamp can manufacture uniform patterns,and can successfully replicate micro/nano patterns by nanoimprint at low temperature.