摘要
Ta2O5在近紫外到近红外波段作为高折射率材料有着广泛的应用,由于色散和吸收,Ta2O5在不同波段的光学常数不尽相同。此外,不同的制备条件下,Ta2O5材料的光学常数也会出现差异。如何精确得出Ta2O5材料在确定工艺条件下的光学常数成了薄膜工作者关心的话题。本文介绍了一种采用电子枪蒸发并加以离子束辅助技术制备Ta2O5薄膜的方法,对薄膜从近紫外到近红外的光学常数进行了拟合,并举例说明了Ta2O5材料在近紫外波段的应用。
Ta2O5 is widely used from near ultraviolet to near infrared waveband as a kind ofhigh refractive index film material. The optical constant of Ta2O5 is vary because of its dispersion and absorption as well as different technological conditions. It is a challenge to confirm the optical constant of Ta2O5 in certain technological Condition. Ta2O5 film was fabricateel by E-beam gun evaporation and ion assisted system in this paper, and fitting of Ta2O5 optical constant, application of Ta2O5 material are introduced.
出处
《长春理工大学学报(自然科学版)》
2008年第4期42-44,共3页
Journal of Changchun University of Science and Technology(Natural Science Edition)
基金
国家自然科学基金(50575235)
关键词
薄膜
色散
吸收
光学常数
film material
dispersion
absorption
optical constant