石英光纤表面化学镀镍–磷–硼合金工艺和表征

Process and deposit characterization of electroless Ni-P-B plating on the surface of quartz optical fiber

以镀层表面光亮度和结合力为双目的指标,采用正交试验分别考察了NiCl2·6H2O、NaH2PO2·H2O、KBH4、H2NCH2CH2NH2、3CdSO4·8H2O的含量和温度对石英光纤表面化学镀Ni–P–B合金的影响,并确定了它们的优化条件分别为:24g/L,10g/L,1.0g/L,24mL/L,0.6mg/L和90°C。考察了粗化时间对Ni–P–B合金镀层质量的影响。用扫描电镜(SEM)、体视显微镜(SM)、电感耦合等离子发射光谱仪(ICP-AES)和X射线衍射(XRD)对镀层的形貌、组成和结构进行了表征和分析。结果表明,在选定的光纤表面预处理条件和最优的化学镀条件下,Ni–P–B合金镀层表面平整光亮,结合力好,热震试验后无起泡和脱落发生。

The effects of the contents of NiCl2·6H2O, NaH2PO2·H2O, KBH4, H2NCH2CH2NH2 and 3CdSO4·SH2O as well as temperature on electroless Ni-P-B plating on quartz optical fiber surface were studied by orthogonal test with the brightness and adhesion of Ni-P-B coatings as two evaluation indexes. The optimal values of the six factors mentioned above were determined as follows： 24 g/L, 10 g/L, 1.0 g/L, 24 mL/L, 0.6 mg/L and 90 ℃, respectively. The effect of roughening time on film quality was examined. The morphology, composition and microstructure of the Ni-P-B deposit were characterized and analyzed by scanning electron microscopy （SEM）, stereomicroscopy （SM）, inductively coupled plasma-atomic emission spectrometry （ICP-AES） and X-ray diffraction （XRD）. The results showed that the Ni P-B film deposited under the conditions of selected pretreatment and the optimal electroless plating features smooth and bright surface as well as good adhesion, and has no blistering and falling off after thermal shock test.