摘要
采用中频孪生非平衡磁控溅射方法制备了纳米晶结构NiOx电致变色薄膜。原子力显微镜(AFM)、掠入射X射线衍射(GID)、X射线反射(XRR)分析薄膜结构、形貌及薄膜厚度;利用电化学设备、紫外分光光度计等手段测试薄膜循环伏安及光谱特性。结果表明:沉积获得NiOx薄膜质地均匀,晶粒尺寸约为4.5 nm,薄膜表面粗糙度Ra=1.659 nm;以Li+离子为致色粒子,厚度60nm的NiOx薄膜在±3 V的高驱动电压下薄膜对可见光透过率调制范围达30%以上,电致变色性能较好。
The NiOx nano films deposited by mid-frequency dual-target magnetron sputtering process were characterized by atom force microscope (AFM), grazing-incidence X-ray diffraction (GID), X-ray reflectivity (XRR), electrochemical tests and ultraviolet spectrophotometry. The results showed that the nanofilms thus prepared are relatively homogeneous with average grain size about 4.5nm and surface roughness (Ra) 1.659nm. With Li^+ ions as eleztrochromic particles, the films have good electrochromic properties. For example, the modulation range of visible light transmittance of a 60hm-thick film under +3V driving voltage comes up to over 30%.
出处
《真空》
CAS
北大核心
2008年第6期17-20,共4页
Vacuum
关键词
电致变色
NIOX
薄膜
磁控溅射
纳米晶
electrochromic
NiOx thin film
magnetron sputtering
nanocrystallite