摘要
利用射频辅助脉冲激光沉积技术,研究了退火处理对制备ZnS薄膜的影响。利用X射线衍射(XRD)和扫描电子显微镜(SEM)对制备样品的结构、形貌特性进行了表征。结果表明:退火处理更有利于ZnS薄膜的发光。
ZnS thin films were deposited by laser with radio frequency plasma by means of annealing. X - ray diffraction （XRD） and scanning electron microscope （SEM） were employed to characterize the structure and morphology of samples. The resuhs showed that annealing may improve the emission efficiency of ZnS thin films.
出处
《武汉工业学院学报》
CAS
2008年第4期113-115,共3页
Journal of Wuhan Polytechnic University
关键词
脉冲激光沉积
ZNS薄膜
退火
pulsed laser deposition （PLD）
ZnS thin film
annealing
