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ICP-AES法测定氧化铪中12种杂质元素 被引量:5

Determination of impurities in HfO_2 by ICP-AES
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摘要 建立了电感耦合等离子发射光谱法测定氧化铪中Al、Ca、Mg、Mn、Na、Ni、Fe、Ti、Zn、Mo、V、Zr等12种杂质元素的分析方法。方法的检测范围为0.004%~5%,标准偏差小于7%,加标回收率94%~103%,方法已用于常见样品分析: In this paper, we established a new method which can analyze 12 kinds of impurities in HfO2 by ICP-AES. The determination range of the impurities was 0.004% - 5%, recoveries were 94% - 103% and the RSDs of determination were 1.0% -6.8%. It has been applied to the determination of impurities in HfO2.
出处 《分析试验室》 CAS CSCD 北大核心 2008年第12期107-109,共3页 Chinese Journal of Analysis Laboratory
关键词 ICP—AES 氧化铪 ICP-AES Hafnium Hafnium dioxide
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