圆柱谐振腔式微波等离子体金刚石膜CVD沉积室的FDTD模拟与优化

Simulation and Optimization of Cylindrical Microwave Plasma Reactor for CVD Diamond Film Growth

微波等离子体化学气相沉积(MPCVD)技术被认为是制备高质量金刚石膜的一种最重要的技术手段。对微波等离子体金刚石膜沉积装置进行模拟与优化,可大大减少设计和改进MPCVD装置时所需要的时间与成本。本文在结合使用谐振腔质量因子和沉积台上方等离子体的密度与分布两个优化判据的基础上,采用Matlab语言和时域有限差分方法,模拟了圆柱谐振腔式微波等离子体金刚石膜沉积装置,并对其主要尺寸进行了优化。

The cylindrical microwave plasma reactor, made of stainless steel, of the microwave plasma chemical vapor deposition （MPCVD） system used in growing high quality diamond films and wafers,was numerically simulated with the finite difference time domain （FDTD） algorithm in Matlab language on the basis of the simplified gas discharge model. The physical quantities, such as the quality factor of the resonator and the plasma density distribution above the substrate of the microwave reactor, were used as the two criteria to optimize the geometry of the resonator.