C／C多层类金刚石薄膜的热稳定性研究

Thermal Stability of C/C Multi-Layers

采用磁过滤直流阴极真空弧源沉积技术,通过改变基体偏压,在单晶Si片和0Cr19Ni9基体表面制备了C/C多层类金刚石薄膜。为了考察多层膜的热稳定性,对薄膜进行了300℃及400℃退火处理,采用X射线光电子能谱、硬度实验及摩擦磨损性能测试分析了退火对薄膜结构及性能的影响。结果表明在400℃范围内多层膜具有较高的热稳定性。

The diamond-like carbon （DLC） multilayers were grown by filtered cathodic vacumn arc deposition on substrates of silicon and 0Cr19Ni9 alloy, and annealed at 300℃ and 400℃; in air. The microstructures and mechanical properties of the DIE multilayers were characterized with X-my diffraction （XRD）, X-ray photoelectron spectroscopy （XPS） ,scanning electron microscopy （SEM） and conventional mechanical probes. The results show that the annealing temperature significantly affects its micmstructures and mechanical properties. For example, annealing at 400℃ optimizes its thermal stability. Possible mechanisms were also tentatively explained.