脉冲偏压电弧离子镀CrN薄膜的表面形貌和性能研究(英文)

Surface Morphology and Properties of CrN Coating Deposited by Superimposed Pulse Bias Cathodic Arc Ion Deposition

采用脉冲偏压电弧离子镀技术沉积了CrN薄膜,并考察了在不同偏压下薄膜的表面形貌、相结构、显微硬度和耐磨性.随着偏压的增加, CrN薄膜表面颗粒逐渐变少,表面粗糙度降低,结晶度增大,偏压为-100 V的CrN薄膜具有致密的表面结构,较高的硬度,最佳的抗磨性能.

In this study, the cathodic arc ion plating technique was used to deposit CrN films on stainless steel substrates. The mechanical properties of the cathodic arc ion deposited CrN films were correlated to the microstructure of the films, which in turn was determined by the vacuum arc deposition parameters. The goal of this study was to examine the effects of bias voltage on the surface morphology, phase structure, microhardness and wear resistance of CrN films. Various standard characterization techniques and equipment, such as X-ray diffraction, ball-on-disc friction tester, surface profilometer, scanning electronic microscopy, microindention system and optical microscopy, were used to analyze and qualify the surface morphology, the mechanical and tribological properties. With increasing e substrate bias voltages, the number of macroparticles decreased. The CrN coatings prepared at -100 V showed smooth surfaces, fine crystalline grains and high hardness and wear resistance.