摘要
离子镀技术是在其真空条件下，应用气体放电技术实现的镀膜，在国外工业生产中已得到广泛的应用，国内对这项技术也进行了研究并在设备和工艺上都取得了很大的成果。离子镀膜技术自１９６３年出现以来，由于这项技术可以在金属零件、塑料、陶瓷、玻璃、纸张等非金属材料上涂覆一层具有不同性能的单一镀层、化合物甚至合金镀层，只要采取不同的工艺，就可获得表面致密的耐腐蚀膜、耐高温膜；表面硬化的耐磨擦膜；润滑膜及各种颜色的装饰膜等等，并且沉积速度快，对环境无污染，从而得到了迅速发展。只介绍利用ＨＣＤ空心阴极离子镀设备进行的研究及生产情况，该设备也是现行应用较为广泛的一种，它集中了物理气相沉积和化学气相沉积的优点于一体。通过试验得出了具体的最佳工艺参数。
Ionplating technology is plating coating of useing gas discharge in vacuum condation It was widely used in other countrys,and our contry obtained great results in this respect too Since 1963 ionplating technology are emerge Because by this technology it can be coated with different function plating in metal parts plastics ceramics glass,paper et So that it was developed very quickly This article only studied worked situanion of the HCD hollow negtive pole ion plat ing This equipment was used widely It had the advantages of physical vapor deposition and chemical vapor deposition The best technological parameter was found by tests
出处
《中国钼业》
1997年第A00期46-48,共3页
China Molybdenum Industry
