摘要
利用磁控反应溅射法制备了不同Al含量的Ti1-xAlxN薄膜。采用能谱仪、X射线衍射仪及纳米显微力学探针分析了薄膜的成分、微结构及薄膜的硬度,研究了Al含量对薄膜的微结构、硬度及高温抗氧化性能的影响。结果表明,薄膜为面心立方结构,呈(111)择优取向;薄膜的硬度及抗氧化性能均随着Al含量增加而提高。
A series of Ti1-xAlxN films were deposited on different substrates by use of reactive magnetron sputtering. The composition, microstrueture and microhardness of the films were analyzed by energy dispersive spectroscopy, X-ray diffraction and nano-indenter. The effects of A1 content on microstructure, hardness and oxidation resistance of the films at high temperature were studied. The results show that the films have the fcc-TiN structures with （111 ）preferred orientation. The oxidation resistance and hardness of Ti1-xAlxN films increase with the increase of A1 content.
出处
《金属热处理》
CAS
CSCD
北大核心
2008年第11期55-58,共4页
Heat Treatment of Metals
基金
国家自然科学基金(50574044)
