摘要
综述了近年来含N、S官能基聚硅烷的研究进展。介绍了吡啶、联吡啶、吡咯等含N官能基与噻吩、硫代官能团等含S官能基取代聚硅烷的制备和光电性能表征,概括了含N、S官能团聚硅烷的分子设计、物理性能与应用领域。最后展望了含N、S官能团聚硅烷研究的发展方向与应用前景。
The recent progress in study of N, S-containing functional polysilanes is reviewed in this paper. Synthesis and photoelectric characterizations of N, S-containing functional polysilanes are introduced. As shown in this paper, N-containing functional groups, such as pyridine, bispyridine and pyrrole, and S-containing functional groups including thiophene, sulfide functional groups are discussed. The molecular design, physical characters and applied areas of N, S-containing functional polysilanes are summarized. The developing trend of study on N, S-containing functional polysilane and application of new materials are forecasted.
出处
《化学进展》
SCIE
CAS
CSCD
北大核心
2008年第12期1903-1908,共6页
Progress in Chemistry
基金
国家自然科学基金项目(No.20574043)
山东省优秀中青年科学家科研奖励基金项目(No.2005BS1101504020641)
山东省博士后科研项目(No.200603086)资助
关键词
聚硅烷
含N官能
含S官能基
光电性能表征
polysilanes
N-containing functional groups
S-containing functional groups
photoelectric characterizations