一种用于三维打印系统的光敏预聚物的合成

Synthesis of Photosensitive Oligomer and Its Use for Three Dimensional Printing

用聚丙二醇二缩水甘油醚作为原料与丙烯酸反应，合成聚丙二醇二缩水甘油醚二丙烯酸酯，较好的合成条件是反应温度宜控制在100℃～110℃，催化剂N，N-二甲基苄胺的质量分数为0．80％，阻聚剂选用对羟基苯甲醚，其质量分数为0．20％～0．40％。通过实验测试，用这种光敏预聚物制备的光敏树脂，可以作为三维打印快速成形系统使用的实体材料。

A photosensitive oligomer of polypropylene glycol diglycidylether diacrylate was prepared by polypropylene glycol diglycidylether and acrylic acid as two main materials. The preferable synthesizing conditions are the temperature： 100℃ --110℃, the catalyst mass fraction of N, N- dimethyl benzylamine： 0.80 % and the inhibitor mass fraction of p-hydroxyanisole： 0.20 % -- 0.40 %. We used this oligomer to prepare photosensitive resin, and the result of experiment shows the resin can be applied to rapid prototyping system of three dimensional printing.