中、印、巴专利发展与技术领域比较优势分析

The Development of Patent and Comparative Advantage of Technical Fields of China,India and Brazil

采用美国专利商标局网站提供的数据,对中国、印度、巴西三国的在美发明专利发展情况进行了时序分析,并在此基础上采用RCI指标法对三国的专利技术领域进行了测度,结果表明我国虽然总量和增速上具有优势,但专利整体反映出的技术水平还不高;印度专利质与量结合相对而言更为合理;巴西在三国比较中质与量都处于比较落后的地位。

On the basis of the data sourced from USPTO〈http：//www. uspto, gov/patft/〉 website, the paper makes a time-series analysis on the development status of patent in China, India and Brazil, furthermore, measures the patent technology fields of the above countries with RCI method. The result shows that China has some advantages of both total quantity and growth rate, but the technical level of the whole patent is low; by comparison, India＇s circumstance of patent is much better, because of its balance on quantity and quality; at last, Brazil is the worst on both quantity and quality.